The core role of silane in semiconductor manufacturing
Semiconductor manufacturing is a high-end application field of silane, in which electronic grade silane gas plays a core role. In integrated circuit manufacturing, chemical vapor deposition (CVD) is a key process, in which silane participates as an important reactant gas. In the CVD process, silane dissociates and reacts under high-frequency alternating electric fields, depositing on the surface of silicon wafers to form solid films. These films can be used to construct circuit component structures, such as single crystal films, polycrystalline films, silicon oxide films, silicon nitride films, etc.


The purity of silane is crucial for semiconductor manufacturing. The purity of electronic grade silane gas needs to reach 5N or above (99.999% or above), and even as high as 6N-7N (international advanced level). High purity silane can ensure the quality of deposited thin films, reduce the impact of impurities on the performance of semiconductor devices, and improve the reliability and stability of the devices. With the continuous development of semiconductor technology, the requirements for purity and quality of silane are also increasing. Silane suppliers need to continuously improve their production processes and quality control levels to meet market demand.